Idal Material For Semiconductor Applications High Performance 5n Aluminium Oxide

Idal Material For Semiconductor Applications High Performance 5n Aluminium Oxide

Product Description 5N nanometer alumina The ultrafine monodisperse precursor was synthesized by the synergistic action of inducing nucleation agent and inhibiting growth agent with the company's high-quality aluminum source, and the nanometer grade alumina crystal shape was shaped by...

Description

Product Description

5N nanometer alumina

The ultrafine monodisperse precursor was synthesized by the synergistic action of inducing nucleation agent and inhibiting growth agent with the company's high-quality aluminum source, and the nanometer grade alumina crystal shape was shaped by introducing template agent. After the unique activation roasting process and high temperature treatment, nano grade and high activity customized crystalline alumina was obtained.

Main use of product
1. Precision polishing 2. High purity alumina ceramic substrate 3. Aluminum nitride raw material 4. High purity alumina grinding microbeads


Electron micrograph

(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide
Grain size distribution map


(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide

Product index

Index parameter unit A-P-03-G
D50 μm 0.1-0.5
Packed density g/cm³ 0.9-1.0
Major impurity content Si ppm ≤3
Fe ppm ≤3
Na ppm ≤3
Mg ppm ≤1


Workshop and warehouse

(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide

(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide

(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide


 

(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide

(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide

(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide


Packing and shipping

1) 25kg woven bag,40 woven bags/jumbo bag.
2) 25kg woven bag,40 woven bags/pallet
3) 25kg paper bag,40 paper bags/pallet
4) 25kg paper bag,40 paper bags/paper box
5) 1000kg /big bag.
6) According you your needs.

(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide

(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide

(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide

(Al2O3 ≥ 99.999%) Idal Material for Semiconductor Applications High Performance 5n Aluminium Oxide

FAQ

 

Q: Who is Sinoal?

A: A globally operated special alumina new materials company with 9+ years of experience, to supply more competitive products and solutions through the continuous innovation of core technology, industrial equipment, and efficient operation mode.

 

Q: How long have you been in this industry?

A: Our company was founded in June 2014, and listed in QILU Equity Trading Center(stock code:100919) in Oct 2016. Then the overall restructuring changed to Limited on Dec. Based on the advantages of the raw material production base of CHALCO, we insist on working to develop high-end products, keep a multi-product, functional, and professional developing orientation of specific alumina, develop the product specified for application-oriented functional materials, contribute a lot for the transformation and upgrading of China's chemical alumina products.

 

Q: What's your delivery time ?

A: Generally it takes around 15 days if the goods are in stock.

 

Q: What is your terms of payment ?

A: (1) T/T,30% deposit in advance,balance 70% against B/L copy;

(2) L/C at sight;

(3) PayPal, 100% payment.

Hot Tags: idal material for semiconductor applications high performance 5n aluminium oxide, China idal material for semiconductor applications high performance 5n aluminium oxide manufacturers, suppliers, factory, Active Alumina Powder, alumina zirconia silica, aluminium sulphate alum, hydroxide of aluminum, mesoporous molecular sieves, zeolite for oxygen plant

(0/10)

clearall